Publications

86 results for Nelson Felix

Single-expose patterning development for EUV lithography
- - Anuja De Silva
  - Karen Petrillo
  - et al.
- 2017
- SPIE Advanced Lithography 2017
Ultrathin EUV patterning stack using polymer brush as an adhesion promotion layer
- - Indira Seshadri
  - Anuja De Silva
  - et al.
- 2017
- SPIE Advanced Lithography 2017
Directed self-assembly patterning strategies for phase change memory applications
- - Robert L. Bruce
  - Gloria Fraczak
  - et al.
- 2017
- SPIE Advanced Lithography 2017
DSA patterning options for logics and memory applications
- - Chi Chun Liu
  - Elliott Franke
  - et al.
- 2017
- SPIE Advanced Lithography 2017
A 7nm FinFET technology featuring EUV patterning and dual strained high mobility channels
- - Ruilong Xie
  - Pietro Montanini
  - et al.
- 2016
- IEDM 2016
Design technology co-optimization assessment for directed self-Assembly-based lithography: Design for directed self-Assembly or directed self-Assembly for design
- - Kafai Lai
  - Chi Chun Liu
  - et al.
- 2017
- J. Micro/Nanolithogr. MEMS MOEMS
Study of alternate hardmasks for extreme ultraviolet patterning
- - Anuja De Silva
  - Indira Seshadri
  - et al.
- 2016
- JVSTB
FINFET technology featuring high mobility SiGe channel for 10nm and beyond
- - Dechao Guo
  - G. Karve
  - et al.
- 2016
- VLSI Technology 2016
Detection of printable EUV mask absorber defects and defect adders by full chip optical inspection of EUV patterned wafers
- - Luciana Meli
  - Scott D. Halle
  - et al.
- 2016
- ASMC 2016
Lithographic qualification of high-Transmission mask blank for 10nm node and beyond
- - Yongan Xu
  - Tom Faure
  - et al.
- 2016
- SPIE Advanced Lithography 2016