Publications

64 results for Luciana Meli

Ultrathin extreme ultraviolet patterning stack using polymer brush as an adhesion promotion layer
- - Indira Seshadri
  - Anuja De Silva
  - et al.
- 2017
- J. Micro/Nanolithogr. MEMS MOEMS
Paper
Development of TiO₂ containing hardmasks through plasma-enhanced atomic layer deposition
- - Anuja De Silva
  - Indira Seshadri
  - et al.
- 2017
- J. Micro/Nanolithogr. MEMS MOEMS
Paper
Electrical study of DSA shrink process and CD rectification effect at sub-60nm using EUV test vehicle
- - Cheng Chi
  - Chi Chun Liu
  - et al.
- 2017
- SPIE Advanced Lithography 2017
Conference paper
Development of TiO₂ containing hardmasks through PEALD deposition
- - Anuja De Silva
  - Indira Seshadri
  - et al.
- 2017
- SPIE Advanced Lithography 2017
Conference paper
DSA patterning options for logics and memory applications
- - Chi Chun Liu
  - Elliott Franke
  - et al.
- 2017
- SPIE Advanced Lithography 2017
Conference paper
Driving down defect density in composite EUV patterning film stacks
- - Luciana Meli
  - Karen Petrillo
  - et al.
- 2017
- SPIE Advanced Lithography 2017
Conference paper
Single-expose patterning development for EUV lithography
- - Anuja De Silva
  - Karen Petrillo
  - et al.
- 2017
- SPIE Advanced Lithography 2017
Conference paper
Ultrathin EUV patterning stack using polymer brush as an adhesion promotion layer
- - Indira Seshadri
  - Anuja De Silva
  - et al.
- 2017
- SPIE Advanced Lithography 2017
Conference paper
Study of alternate hardmasks for extreme ultraviolet patterning
- - Anuja De Silva
  - Indira Seshadri
  - et al.
- 2016
- JVSTB
Paper
Detection of printable EUV mask absorber defects and defect adders by full chip optical inspection of EUV patterned wafers
- - Luciana Meli
  - Scott D. Halle
  - et al.
- 2016
- ASMC 2016
Conference paper