In situ study of the formation of silicide phases in amorphous Co-Si mixed layers
- C. Van Bockstael
- K. De Keyser
- et al.
- 2010
- Microelectronic Engineering
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194 results for Christian Lavoie
Morphological stability and specific resistivity of sub-10 nm silicide films of Ni1-x Ptx on Si substrate
- Zhen Zhang
- Shi Li Zhang
- et al.
- 2010
- Applied Physics Letters
In situ x-ray diffraction study of Ni-Yb interlayer and alloy systems on Si(100)
- W. Knaepen
- J. Demeulemeester
- et al.
- 2009
- JVSTA
Stress determination in nickel monosilicide films using x-ray diffraction
- Conal E. Murray
- Zhen Zhang
- et al.
- 2009
- Journal of Applied Physics
In situ study of the formation of silicide phases in amorphous Ni-Si mixed layers
- C. Van Bockstael
- C. Detavernier
- et al.
- 2009
- Journal of Applied Physics
Controlling nickel silicide phase formation by Si implantation damage
- M. Guihard
- P. Turcotte-Tremblay
- et al.
- 2009
- Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
In situ x-ray diffraction study of metal induced crystallization of amorphous germanium
- W. Knaepen
- S. Gaudet
- et al.
- 2009
- Journal of Applied Physics
Influence of a transient hexagonal phase on the microstructure and morphological stability of NiSi films
- C. Van Bockstael
- K. De Keyser
- et al.
- 2009
- Applied Physics Letters
Nickel silicides and germanides: Phases formation, kinetics and thermal expansion
- C. Perrin
- D. Mangelinck
- et al.
- 2008
- Materials Science and Engineering: B
Simultaneous real-time x-ray diffraction spectroscopy, Rutherford backscattering spectrometry, and sheet resistance measurements to study thin film growth kinetics by Kissinger plots
- D. Smeets
- J. Demeulemeester
- et al.
- 2008
- Journal of Applied Physics