Mirror fabrication for full-wafer laser technology
- David J. Webb
- M. Benedict
- et al.
- 1991
- SPIE Optics, Electro-Optics, and Laser Applications in Science and Engineering 1991
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6 results for G. Sasso
In-situ CI 2 thermal etching of GaAs/AiGaAs for damage removal in a plasma etcher
- J.S. Lechaton
- P. Buchmann
- et al.
- 1991
- IEE/LEOS Summer Topical Meetings 1991
The electron beam proximity printing lithography, a candidate for the 0.35 and 0.25 micron chip generations
- U. Behringer
- W. Haug
- et al.
- 1991
- Microelectronic Engineering
Ridge Formation for AlGaAs GRINSCH Lasers by Cl2 Reactive Ion Etching
- M. Jost
- G.L. Bona
- et al.
- 1990
- IEEE Photonics Technology Letters
Dry ridge etching of AlGaAs GRINSCH lasers
- M. Jost
- P. Buchmann
- et al.
- 1990
- Microelectronic Engineering
Chemically assisted ion beam etching process for high quality laser mirrors
- P. Buchmann
- H.P. Dietrich
- et al.
- 1989
- Microelectronic Engineering