Fernando Marianno, Wang Zhou, et al.
INFORMS 2021
A process for the fabrication of mirror facets for AlGaAs/GaAs laser diodes is described. The major requirements for the fabrication of high quality mirrors have been fulfilled by using Cl2/Ar chemically assisted ion beam etching (CAIBE) and a new multilayer mask structure that produces the smoothest facets. The fabricated AlGaAs/GaAs SQW-GRIN-SCH lasers with etched mirrors show characteristics similar to those of lasers with cleaved mirrors on the same substrate. Results of on-wafer testing of laser threshold uniformity by means of monitor diodes indicate the potential of the process for laser integration and full wafer fabrication and testing. © 1989.
Fernando Marianno, Wang Zhou, et al.
INFORMS 2021
Frank R. Libsch, Takatoshi Tsujimura
Active Matrix Liquid Crystal Displays Technology and Applications 1997
A. Gangulee, F.M. D'Heurle
Thin Solid Films
P. Alnot, D.J. Auerbach, et al.
Surface Science