Interaction Between ti and SiO2
- C.-Y. Ting
- M. Wittmer
- et al.
- 2019
- JES
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34 results for C.-Y. Ting
Electrical Properties of AI/Ti Contact Metallurgy for VLSI Applications
- C.-Y. Ting
- B.L. Crowder
- 2019
- JES
Ambient Gas Effects on the Reaction of Titanium with Silicon
- Subramanian S. lyer
- Chung-Yu Ting
- et al.
- 2019
- JES
High temperature process limitation on TiSi2
- C.-Y. Ting
- F.M. d'Heurle
- et al.
- 2019
- JES
Gate materials consideration for submicron CMOS
- C.-Y. Ting
- B. Davari
- 1989
- Applied Surface Science
Thin-film topography control with transient liquid underlayer
- Igor Y. Khandros
- Robert J. Baseman
- et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Source-Drain Contact Resistance in CMOS with Self-Aligned TiSi2
- Yuan Taur
- Jack Yuan-Chen Sun
- et al.
- 1987
- IEEE T-ED
On the Resistivity of TiSi2: The Implication for Low-Temperature Applications
- Lia Krusin-Elbaum
- Jack Yuan-Chen Sun
- et al.
- 1987
- IEEE T-ED
Cross-sectional transmission electron microscopy investigation of Ti/Si reaction on phosphorus-doped polycrystalline silicon gate
- C.Y. Wong
- F.S. Lai
- et al.
- 1986
- Journal of Applied Physics
Properties of reactively sputtered tungsten films in nitrogen and oxygen
- K.Y. Ahn
- S.B. Brodskv
- et al.
- 1986
- JVSTA