Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
X-ray diffractometric determination of atomic structures in ordered bulk systems is highly automated and has wide application. By contrast, surface crystallography, whether based on photon or electron scattering, is still in a relatively early stage of development. A summary is given of recent selected highlights in efforts to make progress toward surface photoelectron diffractometry and holography by our Berkeley-Penn State group. It is concluded that an automated photoelectron diffractometer is practical and desirable. © 1991.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
A. Gupta, R. Gross, et al.
SPIE Advances in Semiconductors and Superconductors 1990
S. Cohen, J.C. Liu, et al.
MRS Spring Meeting 1999
P. Martensson, R.M. Feenstra
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films