Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
No abstract available.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
David W. Jacobs, Daphna Weinshall, et al.
IEEE Transactions on Pattern Analysis and Machine Intelligence
Robert Manson Sawko, Malgorzata Zimon
SIAM/ASA JUQ
Richard M. Karp, Raymond E. Miller
Journal of Computer and System Sciences