Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
In this work we propose a direct method for solving systems of linear equations which is based on a successive LU-decomposition of matrices of the form I + uvr. Simultaneously, the factors of an LU-decomposition of the coefficient matrix are obtained. A specific choice of the “rank-one decomposition” of the given matrix leads to a variant of the Gauss elimination process. © 1987, Taylor & Francis Group, LLC. All rights reserved.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
A. Skumanich
SPIE OE/LASE 1992
David L. Shealy, John A. Hoffnagle
SPIE Optical Engineering + Applications 2007
Daniel J. Costello Jr., Pierre R. Chevillat, et al.
ISIT 1997