Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
This paper presents novel perturbation bounds for generalized symmetric positive definite eigenvalue problems. The bounds provide the insights for an observed computational phenomenon that is not easily explained by the existing bounds developed previously. Using the new bounds, we provide an analysis of a subspace Newton type procedure for computing a few extreme eigenpairs for generalized symmetric positive definite systems. A preconditioned version of this subspace iterative method is also studied. © 1999 Elsevier Science Inc. All rights reserved.
Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
Ronen Feldman, Martin Charles Golumbic
Ann. Math. Artif. Intell.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004