Laxmi Parida, Pier F. Palamara, et al.
BMC Bioinformatics
Based on UV measurements at 157 nm of in-house fluoropolymers we have selected α-trifluoromethylacrylate and norbornene beating a pendant hexafluoroisopropanol group as our building blocks for 157 nm resist polymers. Polymers consisting of these repeat units have an optical density/μm of 3 or below at 157 nm. We have found that the α-trifluoromethylacrylate derivatives conveniently undergo radical copolymerization with norbornenes, which has provided a breakthrough in preparation of our 157 nm resist polymers. This approach offers flexibility and versatility because an acidic moiety or acid-labile group can be placed in either acrylate or norbornene repeat unit. Other platforms of interest include all-acrylic, all-norbornene, and acrylic-styrenic polymers. © 2001 SPIE - The International Society for Optical Engineering.
Laxmi Parida, Pier F. Palamara, et al.
BMC Bioinformatics
R.A. Brualdi, A.J. Hoffman
Linear Algebra and Its Applications
Ziv Bar-Yossef, T.S. Jayram, et al.
Journal of Computer and System Sciences
Hang-Yip Liu, Steffen Schulze, et al.
Proceedings of SPIE - The International Society for Optical Engineering