Design, preparation, characterization, and lithographic imaging of high performance chemically amplified deep UV resist
- Hiroshi Ito
- G. Breyta
- et al.
- 1997
- ACS Spring 1997
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41 results for Gregory Breyta
Experimental Implementation of an Adiabatic Quantum Optimization Algorithm
- Matthias Steffen
- Wim van Dam
- et al.
- 2003
- Physical Review Letters
Experimental implementation of an adiabatic quantum optimization algorithm
- Matthias Steffen
- Wim Van Dam
- et al.
- 2003
- Physical Review Letters
Experimental realization of an order-finding algorithm with an NMR quantum computer
- Lieven M. K. Vandersypen
- Matthias Steffen
- et al.
- 2000
- Physical Review Letters
Spin-on organic hardmask for topo-patterned substrate
- Kazuhiko Komura
- Yoshi Hishiro
- et al.
- 2014
- SPIE Advanced Lithography 2014
Development of KrF hybrid resist for a dual isolation application
- Sen Liu
- Steven Holmes
- et al.
- 2013
- SPIE Advanced Lithography 2013
Investigation of pattern wiggling for spin-on organic hardmask materials
- Goji Wakamatsu
- Kentaro Goto
- et al.
- 2012
- Proceedings of SPIE - The International Society for Optical Engineering 2012
Hexafluoroalcohol (HFA) containing molecular resist materials for high resolution lithographic applications
- Anuja De Silva
- Linda K. Sundberg
- et al.
- 2011
- SPIE Advanced Lithography 2011
A multilevel copper/low-k/airgap BEOL technology
- S.V. Nitta
- S. Ponoth
- et al.
- 2007
- ADMETA 2007
The effect of photoresist/topcoat properties on defect formation in immersion lithography
- G.M. Wallraff
- Carl E. Larson
- et al.
- 2007
- Proceedings of SPIE 2007