Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
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We determine the maximum spectral radius for (0,1)-matrices with k2 andk2+1 1's, respectively, and for symmetric (0,1)-matrices with zero trace and e= k 21's (graphs with e edges). In all cases, equality is characterized. © 1985.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
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SPIE Optical Engineering + Applications 2007
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Quantum Machine Intelligence