Publication
Journal of Applied Physics
Paper

Ion implantation during film growth and its effect on the superconducting properties of niobium

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Abstract

Low-energy (?500 eV) Kr+ ion bombardment during film growth and its consequences on superconducting properties of Nb are studied in a triode glow discharge sputtering configuration. Tc is depressed from the bulk value at a rate of -0.19 °C/at.% dissolved in the lattice. The residual resistivity shows an increase of 3.4 μΩ cm/at.% Kr. It is shown that radiation damage due to ion bombardment dominates the superconducting properties up to 0.2 at.% dissolved, whereas above this Kr concentration, up to ∼2 at.% Kr, the noble-gas content dominates the transport properties. All films show a dilated lattice which is mainly caused by energetic bombardment during film growth rather than subsequent trapping of the Kr gas.

Date

02 Sep 2008

Publication

Journal of Applied Physics

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