Designing high performance KrF and ArF single layer resists with methacrylate polymers

Abstract

The quest for a high performance positive chemically amplified (CA) resist is a significant challenge. I n this paper we will discuss two approaches to chemically amplified positive resists involving the use of a new and versatile class of acid-labile methacrylate polymers. Methacrylate terpolymers originally designed as chemically amplified positive resists for printed circuit board technology were found to have excellent optical transmission at 193 nm. These materials serve as the basis for a high resolution single layer resist for ArF; imaging. In addition, these terpolymers form stable, one-phase mixtures with a variety of phenolic resins and strongly inhibit the dissolution of phenolics in aqueous base. The new dissolution inhibitors based on MMA-TBMA-MAA terpolymers have unusual and useful properties, including excellent optical transmission at 248 nm, high glass transition temperatures, and dissolution inhibition/promotion power which can be tailored to accommodate the dissolution properties of a wide variety of phenolic resins. © 1993, The Society of Photopolymer Science and Technology(SPST). All rights reserved.