About cookies on this site Our websites require some cookies to function properly (required). In addition, other cookies may be used with your consent to analyze site usage, improve the user experience and for advertising. For more information, please review your options. By visiting our website, you agree to our processing of information as described in IBM’sprivacy statement. To provide a smooth navigation, your cookie preferences will be shared across the IBM web domains listed here.
Paper
Ablative hole formation process in thin tellurium and tellurium-alloy films
Abstract
Static measurement data of contrast ratio versus laser power of single layer Te and Te alloys on polymethylmethacrylate substrates are reported. It is shown that these films can exhibit two regimes of hole formation depending upon laser power. In the lower power regime hole opening must be initiated by voids in the film while for higher powers voids are not necessary for hole opening. This interpretation leads to a better understanding of the hole ablation process as well as some practical consequences.