William G. Van der Sluys, Alfred P. Sattelberger, et al.
Polyhedron
A second‐generation capped deep‐UV portable conformable masking system Is described. Two major improvements of this system are; (1) The replacement of the PMMA bottom layer with the PMMA‐MA‐MAN terpolymer which has a higher thermal stability and a higher deep‐UV sensitivity. (2) The application of the mold hardening process to eliminate the “wings” protruding from the novolac‐terpolymer interface, to facilitate a better choice of developers for the bottom layer, and to provide a better refractive index match between the novolac image lines. Copyright © 1986 Society of Plastics Engineers
William G. Van der Sluys, Alfred P. Sattelberger, et al.
Polyhedron
J.V. Harzer, B. Hillebrands, et al.
Journal of Magnetism and Magnetic Materials
D.D. Awschalom, J.-M. Halbout
Journal of Magnetism and Magnetic Materials
Mark W. Dowley
Solid State Communications