O.F. Schirmer, W. Berlinger, et al.
Solid State Communications
A second‐generation capped deep‐UV portable conformable masking system Is described. Two major improvements of this system are; (1) The replacement of the PMMA bottom layer with the PMMA‐MA‐MAN terpolymer which has a higher thermal stability and a higher deep‐UV sensitivity. (2) The application of the mold hardening process to eliminate the “wings” protruding from the novolac‐terpolymer interface, to facilitate a better choice of developers for the bottom layer, and to provide a better refractive index match between the novolac image lines. Copyright © 1986 Society of Plastics Engineers
O.F. Schirmer, W. Berlinger, et al.
Solid State Communications
Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
Shaoning Yao, Wei-Tsu Tseng, et al.
ADMETA 2011
J. Tersoff
Applied Surface Science