Nelson Felix

Publications

• Towards production ready processing with a state-of-the-art EUV cluster

  • • Karen Petrillo
    • Nicole Saulnier
    • et al.
  • 2015
  • SPIE Advanced Lithography 2015

• EUV processing and characterization for BEOL

  • • Nicole Saulnier
    • Yongan Xu
    • et al.
  • 2015
  • SPIE Advanced Lithography 2015

• Characterization and mitigation of overlay error on silicon wafers with nonuniform stress

  • • T.A. Brunner
    • V. Menon
    • et al.
  • 2014
  • SPIE Advanced Lithography 2014

• CD optimization methodology for extending optical lithography

  • • C. Wong
    • G. Seevaratnam
    • et al.
  • 2013
  • SPIE Advanced Lithography 2013

• Characterization of wafer geometry and overlay error on silicon wafers with nonuniform stress

  • • Timothy A. Brunner
    • Vinayan C. Menon
    • et al.
  • 2013
  • Journal of Micro/Nanolithography, MEMS, and MOEMS

• High order wafer alignment in manufacturing

  • • Michael Pike
    • Nelson Felix
    • et al.
  • 2012
  • SPIE Advanced Lithography 2012

• Advanced overlay control in volume manufacturing

  • • Timothy Wiltshire
    • Christopher Ausschnitt
    • et al.
  • 2011
  • ASMC 2011

• Overlay improvement roadmap: Strategies for scanner control and product disposition for 5-nm overlay

  • • Nelson M. Felix
    • Allen H. Gabor
    • et al.
  • 2011
  • SPIE Advanced Lithography 2011

• Smaller, smarter, faster, and more accurate: The new overlay metrology

  • • Nelson M. Felix
    • Allen H. Gabor
    • et al.
  • 2010
  • SPIE Advanced Lithography 2010

• Simultaneous measurement of optical properties and geometry of resist using multiple scatterometry gratings

  • • Alok Vaid
    • Matthew Sendelbach
    • et al.
  • 2010
  • SPIE Advanced Lithography 2010