IBM Lithography Roadmap and Need for Future Lithography Tools
- Allen Gabor
- Martin Burkhardt
- et al.
- 2025
- EUVL and Source Workshop 2025
Dario Goldfarb
Title
Research Staff Member
Publications
Dry heterometallic resist processing based on thermal sublimation deposition and development
- Dario Goldfarb
- Scott Lewis
- et al.
- 2022
- JM3
Patents
- DE
- 602010012809.1
- EP
- 2310910
- GB
- 2310910
- FR
- 2310910
- US
- 8598018
- JP
- 5379346
- US
- 8536031
- CN
- ZL201080007232.X
- US
- 8435719
- US
- 8395228
Top collaborators
LM
Luciana Meli
Senior Manager: Patterning & Metrology
JR
Jed Rankin
Photomask Supply and Development Strategy
AG
Allen Gabor
Distinguished Engineer