Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
- H. Kim
- S.M. Rossnagel
- 2002
- Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.