Time-dependent series resistance and implications for voltage acceleration models in BEOL TDDB
- Andrew Kim
- Baozhen Li
- et al.
- 2016
- IRPS 2016
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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10 results at IRPS 2016
Effect of H2O on TDDB for a range of ULK ILD materials with varying damage resistance for robust and weak liners
- Eric G. Liniger
- Robert B. Laibowitz
- et al.
- 2016
- IRPS 2016
Towards an appropriate acceleration model for beol tddb
- Ramachandran Muralidhar
- Eric G. Liniger
- et al.
- 2016
- IRPS 2016
Fundamental statistical properties of reconstruction methodology for TDDB with variability in BEOL/MOL/FEOL applications
- Ernest Y. Wu
- James Stathis
- et al.
- 2016
- IRPS 2016
Layout dependence of gate dielectric TDDB in HKMG FinFET technology
- Wen Liu
- Ernest Y. Wu
- et al.
- 2016
- IRPS 2016
Spontaneous photon emission from 32 nm and 14 nm SOI FETs
- Franco Stellari
- Alessandro Ruggeri
- et al.
- 2016
- IRPS 2016
Process optimizations for NBTI/PBTI for future replacement metal gate technologies
- Barry P. Linder
- A. Dasgupta
- et al.
- 2016
- IRPS 2016
The complete time/temperature dependence of I-V drift in PCM devices
- 2016
- IRPS 2016
Triangular Voltage Sweep (TVS) characterisation for Through-Silicon-Via (TSV) reliability
- C. Kothandaraman
- Stephan A. Cohen
- 2016
- IRPS 2016
The projection of the incidence of dielectric cracking during chip joining with lead free solder bumps
- Thomas M. Shaw
- Xiao Hu Liu
- et al.
- 2016
- IRPS 2016