A Two-Dimensional Process Model for Chemimechanical Polish Planarization
- J. Warnock
- 2019
- JES
Publications
509 results at JES
Computer simulation of dendritic electrodeposition
- Micha Tomkiewicz
- 2019
- JES
Reactive Ion Etching of Sputter Deposited Tantalum Oxide and its Etch Selectivity to Tantalum
- Yue Kuo
- 2019
- JES
Corrosion Processes in Magneto-optic Films
- M.M. Farrow
- E.E. Marinero
- 2019
- JES
Computer simulation of boron transport in magnetic czochralski growth of silicon
- W.E. Langlois
- 2019
- JES
Investigation of Reactive-Ion-Etching-Related Fluorocarbon Film Deposition onto Silicon and a New Method for Surface Residue Removal
- G.S. Oehrlein
- J.G. Clabes
- et al.
- 2019
- JES
Equilibrium Carrier Density and Solubility of Antimony in Silicon
- D. Nobili
- R. Angelucci
- et al.
- 2019
- JES
X-Ray Damage Considerations in MOSFET Devices
- J.R. Maldonado
- S.S. Iyer
- 2019
- JES
Approaches to the Design of Radiation-Sensitive Polymeric Imaging Systems with Improved Sensitivity and Resolution
- Jean M.J. Fréchet
- Theodore G. Tessier
- et al.
- 2019
- JES
Electrical Properties of Chemical-Mechanical Polished Tetraethyl Orthosilicate Films with and Without Capping Layers
- S. Cohen
- M.A. Jaso
- et al.
- 2019
- JES