Molecular design for stabilization of chemical amplification resist toward airborne contamination
- Hiroshi Ito
- William P. England
- et al.
- 1993
- Microlithography 1993
Publications
3541 results for Mathematical Sciences
Comparison of liquid- And vapor-phase silylation processes for 193-nm positive-tone lithography
- Mark A. Hartney
- Roderick R. Kunz
- et al.
- 1993
- Microlithography 1993
Positive tone dry-develop resist based on cross-linking a phenolic resin
- Scott A. MacDonald
- C.B. Larson
- et al.
- 1993
- Microlithography 1993
Acid-catalyzed single-layer resists for ArF lithography
- Roderick R. Kunz
- Robert D. Allen
- et al.
- 1993
- Microlithography 1993
New chemistry in the i)esign of chemically amplified positive resists
- Robert D. Allen
- Quan P. Ly
- et al.
- 1993
- Microlithography 1993
Influence of polymer properties on airborne chemical contamination of chemically amplified resists
- W.D. Hinsberg
- Scott A. MacDonald
- et al.
- 1993
- Microlithography 1993
Data structures and perceptual structures
- Bernice E. Rogowitz
- Lloyd A. Treinish
- 1993
- IS&T/SPIE Electronic Imaging 1993
An improved detection model for DCT coefficient quantization
- Heidi A. Peterson
- Albert J. Ahumada
- et al.
- 1993
- IS&T/SPIE Electronic Imaging 1993
Lossy compression of palettized images
- Yung Chen
- Heidi Peterson
- et al.
- 1993
- IS&T/SPIE Electronic Imaging 1993
Porting a calibrated color image across corporate boundaries
- Fred Mintzer
- Ed Pariser
- 1993
- IS&T/SPIE Electronic Imaging 1993