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91 results for Karen Petrillo

A year in the life of an immersion lithography alpha tool at albany NanoTech
- - Michael Tittnich
  - John Hartley
  - et al.
- 2006
- SPIE Advanced Lithography 2006
Silicon containing polymer in applications for 193 nm high NA lithography processes
- - Scan Bums
  - Dirk Pfeiffer
  - et al.
- 2006
- SPIE Advanced Lithography 2006
First microprocessors with immersion lithography
- - D. Gil
  - T. Bailey
  - et al.
- 2005
- SPIE Advanced Lithography 2005
Progress towards developing high performance immersion compatible materials and processes
- - Karen Petrillo
  - Kaushal Patel
  - et al.
- 2005
- Microlithography 2005
Sub-50 nm half-pitch imaging with a low activation energy chemically amplified photoresist
- - G.M. Wallraff
  - D. Medeiros
  - et al.
- 2004
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Current Developments of a High Performance CA Resist for Mask Making Application
- - Wu-Song Huang
  - Wei He
  - et al.
- 2003
- Photomask and Next-Generation Lithography Mask Technology 2003
Does line edge roughness matter?: FEOL and BEOL perspectives
- - Qinghuang Lin
  - Chuck Black
  - et al.
- 2003
- Microlithography 2003
Hardmask technology for sub-100 nm lithographic imaging
- - Katherina Babich
  - Arpan P. Mahorowala
  - et al.
- 2003
- Microlithography 2003
Impact of thin resist processes on post-etch LER
- - Arpan P. Mahorowala
  - Dario L. Goldfarb
  - et al.
- 2003
- Microlithography 2003
Highly etch selective spin-on bottom antireflective coating for use in 193 nm lithography and beyond
- - Dirk Pfeiffer
  - Arpan Mahorowala
  - et al.
- 2003
- Microlithography 2003