Measurement of Thin-Film Dissolution Kinetics using a Quartz Crystal Microbalance
- W.D. Hinsberg
- C.G. Willson
- et al.
- 2019
- JES
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104 results for C. Grant Willson
Approaches to the Design of Radiation-Sensitive Polymeric Imaging Systems with Improved Sensitivity and Resolution
- Jean M.J. Fréchet
- Theodore G. Tessier
- et al.
- 2019
- JES
A Sensitive, Etch Resistant, Positive Tone E-Beam Resist System
- Hiroshi Ito
- L.A. Pederson
- et al.
- 2019
- JES
Directed self-assembly of silicon-containing block copolymer thin films
- Michael J. Maher
- Charles T. Rettner
- et al.
- 2015
- ACS AMI
Poling and crosslinking processes in NLO polymers
- William K. Bell
- Brandon M. Rawlings
- et al.
- 2014
- J Polym Sci Part A
On the absence of post-plasma etch surface and line edge roughness in vinylpyridine resists
- R. Bruce
- Florian Weilnboeck
- et al.
- 2011
- Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
Visco‐elastic properties of thin films probed with a quartz crystal resonator
- D. Johannsmann
- F.W. Embs
- et al.
- 2011
- Makromolekulare Chemie. Macromolecular Symposia
Molecular structure effects on dry etching behavior of Si-containing resists in oxygen plasma
- R. Bruce
- T. Lin
- et al.
- 2010
- Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
Penultimate effect in radical copolymerization of 2- trifluoromethylacrylates
- Hiroshi Ito
- Brian C. Trinque
- et al.
- 2008
- J Polym Sci Part A
Ramifications of lubrication theory on imprint lithography
- Matthew Colburn
- Byung Jin Choi
- et al.
- 2004
- Microelectronic Engineering