Photosensitized polystyrene as a high efficiency relief hologram medium
- F.M. Schellenberg
- C.G. Willson
- et al.
- 1989
- Proceedings of SPIE 1989
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104 results for C. Grant Willson
Novel photoresist design based on electrophilic aromatic substitution
- B. Reck
- R.D. Allen
- et al.
- 1988
- SPE Regional Technical Conference 1988
Photodeformable polymer system for holography.
- C.G. Willson
- F.M. Schellenberg
- et al.
- 1987
- CLEO 1987
Positive/negative mid uv resists with high thermal stability
- Hiroshi Ito
- Grant Willson
- 1989
- Proceedings of SPIE 1989
New Diazoketone Dissolution Inhibitors For Deep U.V. Photolithography
- Manfred Regitz
- Robert D. Miller
- et al.
- 1989
- Proceedings of SPIE 1989
Organic resist materials
- C.G. Willson
- Murrea J. Bowden
- 1986
- Advances in Chemistry Series
POLYMERIZATION OF 1-(TRIMETHYLSTANNYL)ALKYL METHACRYLATES: A NEW CLASS OF ORGANOTIN POLYMERS.
- Jeff W. Labadie
- Scott A. MacDonald
- et al.
- 1986
- ACS Division of Polymer Chemistry Anaheim Meeting 1986
A 2-layer resist system derived from trimethylsilylstyrene
- S.A. Macdonald
- R.D. Allen
- et al.
- 1989
- Proceedings of SPIE 1989
Use of a quartz crystal microbalance rate monitor to examinfthotofroduct effects on resistthssolution
- W.D. Hinsberg
- C.G. Willson
- et al.
- 1989
- Proceedings of SPIE 1989
PHOTOINITIATED INTERFACIAL CATIONIC POLYMERIZATION.
- C.G. Willson
- Anders Hult
- et al.
- 1984
- ACS National Meeting 1984