Deprotection volume characteristics and line edge morphology in chemically amplified resists
- Ronald L. Jones
- Tengjiao Hu
- et al.
- 2003
- Microlithography 2003
Publications
Date
Featured collections
Popular topics
104 results for C. Grant Willson
Diffusion induced line edge roughness
- Michael D. Stewart
- Gerard M. Schmid
- et al.
- 2003
- Microlithography 2003
Probabilistic model for the mechanism of phenolic polymer dissolution
- Lewis W. Flanagin
- Christopher L. McAdams
- et al.
- 1998
- Microlithography 1998
Recent advances in chemically amplified resist materials
- C.G. Willson
- J.F. Cameron
- et al.
- 1992
- ACS PMSE 1992
Top-surface-imaging resist for deep UV lithography
- Scott A. MacDonald
- H. Schlosser
- et al.
- 1991
- International Technical Conference on Photopolymers 1991
Airborne chemical contamination of a chemically amplified resist
- Scott A. MacDonald
- N.J. Clecak
- et al.
- 1991
- Microlithography 1991
Synthesis, characterization, and lithographic behavior of methylated poly(4-hydroxystyrene)
- D.R. McKean
- T.P. Sauer
- et al.
- 1990
- ACS Division of Polymer Chemistry Washington DC Meeting 1990
Crosslinked epoxy polymers with large and stable nonlinear optical susceptibilities
- J. Twieg
- C. Grant Willson
- et al.
- 1989
- Proceedings of SPIE 1989
Novolac based deep-uv resists
- Dennis R. McKean
- Scott A. Macdonald
- et al.
- 1989
- Proceedings of SPIE 1989
Zero-Misalignment lithographic process using a photoresist with wavelength-selected tone
- William D. Hinsberg
- Scott A. MacDonald
- et al.
- 1989
- Proceedings of SPIE 1989