A comparative study of NBTI as a function of Si substrate orientation and gate dielectrics (SiON and SiON/HfO 2)
- S. Zafar
- M. Yang
- et al.
- 2005
- VLSI Technology 2005
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72 results for Alessandro Callegari
A study of negative bias temperature instability (NBTI) in pFETs
- Sufi Zafar
- James Stathis
- et al.
- 2005
- ECS Meeting 2005
Charge trapping & NBTI in high k gate dieectric stacks
- Sufi Zafar
- A.C. Callegari
- et al.
- 2005
- ECS Meeting 2005
Systematic study of pFET Vt with Hf-based gate stacks with poly-Si and FUSI gates
- E. Cartier
- V. Narayanan
- et al.
- 2004
- VLSI Technology 2004
A model for negative bias temperature instability (NBTI) in oxide and high κ pFETs
- Sufi Zafar
- Byoung H. Lee
- et al.
- 2004
- VLSI Technology 2004
Dual work function metal gate CMOS using CVD metal electrodes
- V. Narayanan
- A.C. Callegari
- et al.
- 2004
- VLSI Technology 2004
Ion beam alignment for liquid crystal display fabrication
- J. Doyle
- P. Chaudhari
- et al.
- 2003
- Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Hydrogenated amorphous carbon film used as an alignment layer for liquid crystal displays
- Y. Kato
- Y. Nakagawa
- et al.
- 2002
- EURODISPLAY 2002
DUV stability of carbon films for attenuated phase shift mask applications
- Alessandro Callegari
- Katherina Babich
- et al.
- 1998
- SPIE Advanced Lithography 1998
Effects of underlayer on performance of bilayer resists for 248-nm lithography
- Katherina Babich
- Alessandro Callegari
- et al.
- 1998
- Microlithography 1998