Characterizing fluorocarbon assisted atomic layer etching of Si using cyclic Ar/C4F8 and Ar/CHF3 plasma
- 2016
- Journal of Chemical Physics
Publications
This is our catalog of recent publications authored by IBM researchers, in collaboration with the global research community. We’re currently adding our back catalog of more than 110,000 publications. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
10 results for Gottlieb S. Oehrlein
He plasma pretreatment of organic masking materials for performance improvement during pattern transfer by plasma etching
- 2016
- JVSTB
Formation of nanometer-thick delaminated amorphous carbon layer by two-step plasma processing of methacrylate-based polymer
- 2015
- JVSTB
Significance of plasma-photoresist interactions for atomic layer etching processes with extreme ultraviolet photoresist
- 2020
- JVSTA
Selective atomic layer etching of HfO2 over silicon by precursor and substrate-dependent selective deposition
- 2020
- JVSTA
Rethinking surface reactions in nanoscale dry processes toward atomic precision and beyond: A physics and chemistry perspective
- 2019
- Japanese Journal of Applied Physics
Achieving ultrahigh etching selectivity of SiO2 over Si3N4 and Si in atomic layer etching by exploiting chemistry of complex hydrofluorocarbon precursors
- 2018
- JVSTA
Polymer etching by atmospheric-pressure plasma jet and surface micro-discharge sources: Activation energy analysis and etching directionality
- 2018
- Plasma Processes and Polymers
Fluorocarbon assisted atomic layer etching of SiO2 and Si using cyclic Ar/C4F8 and Ar/CHF3 plasma
- 2016
- JVSTA
Application of cyclic fluorocarbon/argon discharges to device patterning
- 2016
- JVSTA