Microscopic identification and electronic structure of a di-hydrogen vacancy complex in silicon by optical detection of magnetic resonance
- W.M. Chen
- O.O. Awadelkarim
- et al.
- 1990
- Physical Review Letters
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
Date
Featured collections
Popular topics
117 results for Gottlieb S. Oehrlein
Reactive ion etching lag investigation of oxide etching in fluorocarbon electron cyclotron resonance plasmas
- O. Joubert
- G.S. Oehrlein
- et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Etch tailoring through flexible end-point detection
- D. Angell
- G.S. Oehrlein
- 1990
- SPIE Processing Integration 1990
DIFFUSION OF ION-IMPLANTED BORON AND PHOSPHORUS DURING RAPID THERMAL ANNEALING OF SILICON.
- G.S. Oehrlein
- R. Ghez
- et al.
- 1984
- ICDS 1984
STUDY OF SILICON CONTAMINATION AND NEAR-SURFACE DAMAGE CAUSED BY CF//4/H//2 REACTIVE ION ETCHING.
- G.S. Oehrlein
- R.M. Tromp
- et al.
- 1983
- ECS Meeting 1983
ENHANCED DIFFUSION IN SHORT TIME ANNEALED ARSENIC AND BORON ION IMPLANTED SILICON.
- T.O. Sedgwick
- S. Cohen
- et al.
- 1983
- ECS Meeting 1983
PROPERTIES OF AMORPHOUS TANTALUM PENTOXIDE THIN FILMS ON SILICON.
- G.S. Oehrlein
- 1983
- ECS Meeting 1983
ENHANCED DIFFUSION IN SHORT TIME ANNEALED ARSENIC AND BORON ION IMPLANTED SILICON.
- T.O. Sedgwick
- S. Cohen
- et al.
- 1983
- VLSI Science and Technology 1983
Characterizing fluorocarbon assisted atomic layer etching of Si using cyclic Ar/C4F8 and Ar/CHF3 plasma
- Dominik Metzler
- Chen Li
- et al.
- 2016
- Journal of Chemical Physics
He plasma pretreatment of organic masking materials for performance improvement during pattern transfer by plasma etching
- Dominik Metzler
- Florian Weilnboeck
- et al.
- 2016
- JVSTB