Publications

57 results for Nicolas Loubet

Structural and Electrical Demonstration of SiGe Cladded Channel for PMOS Stacked Nanosheet Gate-All-Around Devices
- - Shogo Mochizuki
  - B. Colombeau
  - et al.
- 2020
- VLSI Technology 2020
Composite Interconnects for High-Performance Computing beyond the 7nm Node
- - P. Bhosale
  - S. Parikh
  - et al.
- 2020
- VLSI Technology 2020
BEOL compatible high-capacitance MIMCAP structure using a novel high k material
- - P. Jamison
  - John Massey
  - et al.
- 2020
- IMCS 2020
Multiple-Vt Solutions in Nanosheet Technology for High Performance and Low Power Applications
- - Ruqiang Bao
  - Reinaldo A. Vega
  - et al.
- 2019
- IEDM 2019
Full Bottom Dielectric Isolation to Enable Stacked Nanosheet Transistor for Low Power and High Performance Applications
- - J. Zhang
  - S. Pancharatnam
  - et al.
- 2019
- IEDM 2019
Imaging, Modeling and Engineering of Strain in Gate-All-Around Nanosheet Transitors
- - S. Reboh
  - V. Boureau
  - et al.
- 2019
- IEDM 2019
A Novel Dry Selective Etch of SiGe for the Enablement of High Performance Logic Stacked Gate-All-Around NanoSheet Devices
- - Nicolas Loubet
  - T. Devarajan
  - et al.
- 2019
- IEDM 2019
Self-Allancd Gate Contact (SAGC) for CMOS technology scaling beyond 7nm
- - Ruilong Xie
  - Chanro Park
  - et al.
- 2019
- VLSI Technology 2019
Strain engineering in functional materials
- - G. Tsutsui
  - Shogo Mochizuki
  - et al.
- 2019
- AIP Advances
Toward High Performance SiGe Channel CMOS: Design of High Electron Mobility in SiGe nFinFETs Outperforming Si
- - Choonghyun Lee
  - Richard G. Southwick
  - et al.
- 2018
- IEDM 2018