Etching with electron beam-generated plasmas: Selectivity versus ion energy in silicon-based films
- S. G. Walton
- D. R. Boris
- et al.
- 2021
- JVSTA
Publications
109 results for Sebastian Engelmann
Effect of surface temperature on GeSbTe damage formation during plasma processing
- L. Buzi
- J. M. Papalia
- et al.
- 2021
- SPIE Advanced Lithography 2021
Significance of plasma-photoresist interactions for atomic layer etching processes with extreme ultraviolet photoresist
- Adam Pranda
- Kang Yi Lin
- et al.
- 2020
- JVSTA
Selective atomic layer etching of HfO2 over silicon by precursor and substrate-dependent selective deposition
- Kang Yi Lin
- Chen Li
- et al.
- 2020
- JVSTA
Utilizing photosensitive polymers to evaluate UV radiation exposures in different plasma chamber configurations
- L. Buzi
- Hiroyuki Miyazoe
- et al.
- 2020
- JVSTA
Control of surface oxide formation in plasma-enhanced quasiatomic layer etching of tantalum nitride
- Nathan Marchack
- Jon L. Innocent-Dolor
- et al.
- 2020
- JVSTA
Advances in Interfacing Optical Fibers to Nanophotonic Waveguides Via Mechanically Compliant Polymer Waveguides
- Tymon Barwicz
- Swetha Kamlapurkar
- et al.
- 2020
- IEEE JSTQE
Hydrocarbon layer formation and removal studies on SiN films etched in halogen/hydrofluorocarbon plasmas
- L. Buzi
- J. M. Papalia
- et al.
- 2020
- SPIE Advanced Lithography 2020
Integrated Metamaterial Interfaces for Self-Aligned Fiber-to-Chip Coupling in Volume Manufacturing
- Tymon Barwicz
- Bo Peng
- et al.
- 2019
- IEEE JSTQE
Utilizing surface modification in plasma-enhanced cyclic etching of tantalum nitride to surpass lithographic limits
- Nathan Marchack
- Keith Hernandez
- et al.
- 2019
- Plasma Processes and Polymers