Publications

23 results for Mary Breton

Novel ellipsometry-based machine learning technique for characterization of low sensitivity critical dimensions within gate-all-around transistors
- - Houssam Chouaib
  - Valeria Dimastrodonato
  - et al.
- 2024
- SPIE Advanced Lithography + Patterning 2024
Conference paper
Spectral interferometry for fully integrated device metrology
- - Daniel Schmidt
  - Manasa Medikonda
  - et al.
- 2023
- JM3
Paper
Vertical Travelling Scatterometry for Metrology on Fully Integrated Devices
- - D. Schmidt
  - Manasa Medikonda
  - et al.
- 2022
- SPIE Advanced Lithography 2022
Conference paper
Scatterometry based methodologies for characterization of MRAM technology
- - Manasa Medikonda
  - Daniel Schmidt
  - et al.
- 2022
- SPIE Advanced Lithography 2022
Conference paper
Development of SiGe Indentation Process Control for Gate-All-Around FET Technology Enablement
- - Daniel Schmidt
  - Aron Cepler
  - et al.
- 2022
- IEEE Trans Semicond Manuf
Paper
Review of nanosheet metrology opportunities for technology readiness
- - Mary A. Breton
  - Daniel Schmidt
  - et al.
- 2022
- JM3
Review
Highly Selective SiGe Dry Etch Process for the Enablement of Stacked Nanosheet Gate-All-Around Transistors
- - Curtis Durfee
  - Subhadeep Kal
  - et al.
- 2021
- ECS Meeting 2021
Conference paper
Advanced EUV Resist Characterization using Scatterometry and Machine Learning
- - Daniel Schmidt
  - Karen Petrillo
  - et al.
- 2021
- ASMC 2021
Conference paper
EUV single exposure via patterning at aggressive pitch
- - Jing Guo
  - Jennifer Church
  - et al.
- 2021
- SPIE Advanced Lithography 2021
Conference paper
Nanosheet Metrology Opportunities for Technology Readiness
- - Mary Breton
  - Daniel Schmidt
  - et al.
- 2021
- SPIE Advanced Lithography 2021
Conference paper