Is selective CVD an improvement for the titanium silicide process in sub-quarter micron technology? A phase formation study using x-ray diffractionR.A. RoyCryil Cabral Jr.et al.1998MRS Spring Meeting 1998
Is selective CVD an improvement for the titanium silicide process in sub-quarter micron technology? A phase formation study using x-ray diffractionR.A. RoyCryil Cabral Jr.et al.1998MRS Spring Meeting 1998