203 μa threshold current strained V-groove lasers
- S. Tiwari
- G.D. Pettit
- et al.
- 1992
- IEDM 1992
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19 results for K.R. Milkove
High-capacity, self-assembled metal-oxide-semiconductor decoupling capacitors
- Charles T. Black
- Kathryn W. Guarini
- et al.
- 2004
- IEEE Electron Device Letters
Recent advances in MRAM technology
- W.J. Gallagher
- D.W. Abraham
- et al.
- 2005
- VLSI Technology 2005
Dual work function metal gate CMOS using CVD metal electrodes
- V. Narayanan
- A.C. Callegari
- et al.
- 2004
- VLSI Technology 2004
Analysis of an extreme low-κ organosilicate dielectric film exposed to representative plasmas and to a restorative process
- M. Colburn
- S.V. Nitta
- et al.
- 2003
- AMC 2003
Two-level BEOL processing for rapid iteration in MRAM development
- Michael C. Gaidis
- Eugene J. O'Sullivan
- et al.
- 2006
- IBM J. Res. Dev
Nanoscale patterning using self-assembled polymers for semiconductor applications
- K.W. Guarini
- C.T. Black
- et al.
- 2001
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Integration of self-assembled diblock copolymers for semiconductor capacitor fabrication
- C.T. Black
- K.W. Guarini
- et al.
- 2001
- Applied Physics Letters
Effects of argon addition to a platinum dry etch process
- K.R. Milkove
- J. Coffin
- et al.
- 1998
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Dry etching of (Ba,Sr)TiO3 with Cl2, SF6, and CF4
- K.R. Milkove
- 1998
- International Symposium on Integrated Ferroelectrics 1998