Annealing kinetics of a-Si:H deposited by concentric-electrode rf glow discharge at room temperature
- J.P. Conde
- K.K. Chan
- et al.
- 1993
- Journal of Applied Physics
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3 results for J.M. Blum
Deposition of amorphous silicon using a tubular reactor with concentric-electrode confinement
- J.P. Conde
- K.K. Chan
- et al.
- 1992
- Journal of Applied Physics
The effect of the flow of silane on the properties of a-Si:H deposited by concentric-electrode radio frequency glow-discharge
- J.P. Conde
- K.K. Chan
- et al.
- 1992
- Journal of Applied Physics