Acid photogeneration from sulfonium salts in solid polymer matrices
- D.R. McKean
- U. Schaedeli
- et al.
- 1988
- ACS PMSE 1988
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34 results for D.R. McKean
Relationship of photoacid production and fluorescence quenching of anthryl sensitizers by aryl iodonium and sulfonium salts
- G.M. Wallraff
- D.R. McKean
- et al.
- 1989
- ACS PMSE 1989
Novolac based deep-uv resists
- Dennis R. McKean
- Scott A. Macdonald
- et al.
- 1989
- Proceedings of SPIE 1989
New Diazoketone Dissolution Inhibitors For Deep U.V. Photolithography
- Manfred Regitz
- Robert D. Miller
- et al.
- 1989
- Proceedings of SPIE 1989
SEMIEMPIRICAL CALCULATIONS OF ELECTRONIC SPECTRA: USE IN THE DESIGN OF MID-UV SENSITIZERS.
- R.D. Miller
- D.R. McKean
- et al.
- 1983
- ACS National Meeting 1983
Alkylated poly(4-hydroxystyrene) derivatives for deep ultraviolet lithography
- D.R. McKean
- W.D. Hinsberg
- et al.
- 1992
- J. Photopolym. Sci. Tech.
Design of a positive resist for projection lithography in the mid‐UV
- Grant Willson
- Robert Miller
- et al.
- 2004
- Polymer Engineering & Science
Synthesis and Properties of Diazopiperidiones for Use in Nonchemically Amplified Deep UV Photoresists
- Peter I. Tattersall
- David Breslin
- et al.
- 2004
- Chemistry of Materials
The effect of polymer structure on the efficiency of acid generation from triarylsulfonium salts
- Dennis R. McKean
- Ulrich P. Schaedeli
- et al.
- 2003
- Journal of Polymer Science Part A: Polymer Chemistry
Ring Opening of Cyclopropyl Ketones by Trimethylsilyl Iodide
- Robert D. Miller
- Dennis R. McKean
- 2002
- Journal of Organic Chemistry