Base-catalyzed photosensitive polyimide
- D.R. McKean
- G.M. Wallraff
- et al.
- 1991
- ACS Spring 1991
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34 results for D.R. McKean
Base-catalyzed photosensitive polyimide
- Dennis R. McKean
- Gregory M. Waliraff
- et al.
- 1993
- Microlithography 1993
Acid generation and acid diffusion in photoresist films
- D.R. McKean
- R.D. Allen
- et al.
- 1992
- Microlithography 1992
Polymer effects on the photochemistry of triarylsulfonium salts
- D.R. McKean
- R.D. Allen
- et al.
- 1991
- SPIE San Diego 1991
New activating groups for poly(aryl ether) and poly(aryl sulfide) synthesis
- Jeff W. Labadie
- S.Y. Kim
- et al.
- 1991
- ACS Division of Polymer Chemistry Atlanta Meeting 1991
Synthesis, characterization, and lithographic behavior of methylated poly(4-hydroxystyrene)
- D.R. McKean
- T.P. Sauer
- et al.
- 1990
- ACS Division of Polymer Chemistry Washington DC Meeting 1990
Modified polyhydroxystyrenes as matrix resins for dissolution inhibition type photoresists
- G. Pawlowski
- T.P. Sauer
- et al.
- 1990
- Microlithography 1990
A highly etch resistant, negative resist for deep-UV and electron beam lithography
- Dennis R. McKean
- Nicholas J. Clecak
- et al.
- 1990
- Microlithography 1990
Investigations on the structural morphology of sulfonium salt containing polymethacrylate films
- R.D. Allen
- U. Schaedeli
- et al.
- 1989
- ACS PMSE 1989
Polymeric matrix effects on the efficiency of acid generation from triphenylsulfonium salts
- D.R. McKean
- U. Schaedeli
- et al.
- 1989
- ACS PMSE 1989