Julian J. Hsieh
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Measurements of thermoelectric power versus temperature of (CH)x doped with various concentrations of AsF5 are reported. These reflect the semiconductor-metal transition at ∼ 1% doping. The "pristine" thermopower is consistent with the conductivity-derived activation energy of 0.35 eV, and a residual defect/impurity carrier concentration of 0.1%. An analysis of the conductivity based on these data indicates that, while the disorder is certainly important, it is not the cause of the transition. © 1980.
Julian J. Hsieh
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
David B. Mitzi
Journal of Materials Chemistry
Arvind Kumar, Jeffrey J. Welser, et al.
MRS Spring 2000
Gregory Czap, Kyungju Noh, et al.
APS Global Physics Summit 2025