Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
Using work of Hao Wang, we exhibit a tiling characterization of the bits of the halting probability.
Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
Daniel J. Costello Jr., Pierre R. Chevillat, et al.
ISIT 1997
I.K. Pour, D.J. Krajnovich, et al.
SPIE Optical Materials for High Average Power Lasers 1992
A. Grill, B.S. Meyerson, et al.
Proceedings of SPIE 1989