Techniques for the compositional and chemical state analysis of surfaces and thin films

Abstract

In this review we will make a brief comparison of analytical techniques yielding information on the composition and chemical states of surfaces and thin films. We will include in this discussion CBS (charged particle backscattering spectroscopy), IIXS (ion induced X-ray spectrometry), EMP (electron microprobe), AM (analytical microscopy), AES (Auger electron spectroscopy), XPS (X-ray photoelectron spectroscopy), XRF (X-ray fluorescence spectroscopy) and SIMS (secondary ion mass spectroscopy). The major accent of this treatment is on the fundamental physical processes of each technique as these affect both the sensitivity and our quantitative understanding. © 1983.