Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
In the past few years, the application of aspect-oriented software development (AOSD) technologies has helped improve the development, integration, deployment, evolution, and quality of object-oriented and other software for a growing community of software developers. The Concern Manipulation Environment (CME) is an open-source Eclipse project that targets aspect-oriented technologies. The CME contains task-oriented tools for usage approaches that apply aspect orientation in different development and deployment scenarios. The CME also provides component- and framework-level support for building aspect-oriented tools for a variety of types of software artifacts. © Copyright 2005 by International Business Machines Corporation.
Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
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