Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
In the past few years, the application of aspect-oriented software development (AOSD) technologies has helped improve the development, integration, deployment, evolution, and quality of object-oriented and other software for a growing community of software developers. The Concern Manipulation Environment (CME) is an open-source Eclipse project that targets aspect-oriented technologies. The CME contains task-oriented tools for usage approaches that apply aspect orientation in different development and deployment scenarios. The CME also provides component- and framework-level support for building aspect-oriented tools for a variety of types of software artifacts. © Copyright 2005 by International Business Machines Corporation.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Maurice Hanan, Peter K. Wolff, et al.
DAC 1976
Renu Tewari, Richard P. King, et al.
IS&T/SPIE Electronic Imaging 1996
Elizabeth A. Sholler, Frederick M. Meyer, et al.
SPIE AeroSense 1997