S. Cohen, T.O. Sedgwick, et al.
MRS Proceedings 1983
Spectroscopic studies of Si(100) fluorinated by the dissociative chemisorption of XeF2 at 80 K are reported. LEED and XPS measurements suggest the formation of a disordered fluorosilyl layer after low fluorine doses. Separate EELS experiments identified a fluorine induced 800 cm −1loss, suggesting that SiF is the major surface fluorosilyl species. Vibrational evidence for coadsorbed hydrogen, due to side reactions during fluorination, is also found. Recent synchrotron soft x-ray photoemission spectra support the SiF identification and also demonstrate dramatic crystallographic effects in comparative Si(111) studies. © 1984, American Vacuum Society. All rights reserved.
S. Cohen, T.O. Sedgwick, et al.
MRS Proceedings 1983
Sharee J. McNab, Richard J. Blaikie
Materials Research Society Symposium - Proceedings
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
A. Krol, C.J. Sher, et al.
Surface Science