O.F. Schirmer, W. Berlinger, et al.
Solid State Communications
A 25 kV pulsed electron beam was used to harden 0.5-3.0//m thick4Z-type, MacDermid, and polyamic acid (PMDA 4- ODA) resist patterns. The resist profiles are stable against high-temperature treatment that ranges between 200–350 °C. The short pulse —100 ns, electron beams employed in resist hardening are produced from a cold cathode in 30–50 mTorr air by discharging energy stored in a 7.5 nF capacitor producing a dose/pulse — 1 μC/cm2 at the processed surface. Comparisons with conventional hardening methods using ultraviolet emission from a high-pressure mercury lamp, a windowless, vacuum ultraviolet (VUV) lamp, and low-energy electron emission from a cw source are also made. © 1988, Materials Research Society. All rights reserved.
O.F. Schirmer, W. Berlinger, et al.
Solid State Communications
R.J. Gambino, N.R. Stemple, et al.
Journal of Physics and Chemistry of Solids
J.H. Kaufman, Owen R. Melroy, et al.
Synthetic Metals
M. Hargrove, S.W. Crowder, et al.
IEDM 1998