Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
We present three alternative simple constructions of small probability spaces on n bits for which any k bits are almost independent. The number of bits used to specify a point in the sample space is (2 + o(1)) (log log n + k/2 + log k + log 1/ϵ), where ϵ is the statistical difference between the distribution induced on any k bit locations and the uniform distribution. This is asymptotically comparable to the construction recently presented by Naor and Naor (our size bound is better as long as ϵ < 1/(k log n)). An additional advantage of our constructions is their simplicity. Copyright © 1992 Wiley Periodicals, Inc., A Wiley Company
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Naga Ayachitula, Melissa Buco, et al.
SCC 2007
Imran Nasim, Michael E. Henderson
Mathematics
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007