Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
We present three alternative simple constructions of small probability spaces on n bits for which any k bits are almost independent. The number of bits used to specify a point in the sample space is (2 + o(1)) (log log n + k/2 + log k + log 1/ϵ), where ϵ is the statistical difference between the distribution induced on any k bit locations and the uniform distribution. This is asymptotically comparable to the construction recently presented by Naor and Naor (our size bound is better as long as ϵ < 1/(k log n)). An additional advantage of our constructions is their simplicity. Copyright © 1992 Wiley Periodicals, Inc., A Wiley Company
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
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IEEE International Symposium on Information Theory - Proceedings
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SPIE Photomask Technology + EUV Lithography 2009
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