M.A. Lutz, R.M. Feenstra, et al.
Surface Science
Analogues of poly(methyl methacrylate) (PMMA) incorporating halogen atoms in the α-position or in the ester side group have recently attracted much attention as sensitive electron-beam positive resists. Ito et al. have reported that methyl α-(trifluoromethyl)acrylate(MTFMA) does not undergo radical homopolymerization but readily polymerizes bypyridine initiation due to the low electron density on the double bond. © 1984, American Chemical Society. All rights reserved.
M.A. Lutz, R.M. Feenstra, et al.
Surface Science
I. Morgenstern, K.A. Müller, et al.
Physica B: Physics of Condensed Matter
E. Babich, J. Paraszczak, et al.
Microelectronic Engineering
S.F. Fan, W.B. Yun, et al.
Proceedings of SPIE 1989