R. Ghez, J.S. Lew
Journal of Crystal Growth
Computer calculations of the formation of a percolation path across a thin oxide are used to model breakdown. Quantitative agreement with the measured interface state density at breakdown is obtained. The case of homogeneously distributed defects is compared to exponentially distributed defects near one interface.
R. Ghez, J.S. Lew
Journal of Crystal Growth
T.N. Morgan
Semiconductor Science and Technology
Thomas E. Karis, C. Mark Seymour, et al.
Rheologica Acta
J.H. Stathis, R. Bolam, et al.
INFOS 2005