J.H. Stathis, R. Bolam, et al.
INFOS 2005
Computer calculations of the formation of a percolation path across a thin oxide are used to model breakdown. Quantitative agreement with the measured interface state density at breakdown is obtained. The case of homogeneously distributed defects is compared to exponentially distributed defects near one interface.
J.H. Stathis, R. Bolam, et al.
INFOS 2005
Sung Ho Kim, Oun-Ho Park, et al.
Small
Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007