Min Yang, Jeremy Schaub, et al.
Technical Digest-International Electron Devices Meeting
Paper
Platform-dependent properties of 193nm single layer resists
Abstract
A primary consideration in the design of 193nm single layer resists involves the choice of the polymer platform on which the resist is to be constructed. Two main routes (acrylics and cyclic olefins) exist for 193nm resist design. The advantages and challenges of each will be illustrated and discussed. ©1998TAPJ.
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