Julian J. Hsieh
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
A primary consideration in the design of 193nm single layer resists involves the choice of the polymer platform on which the resist is to be constructed. Two main routes (acrylics and cyclic olefins) exist for 193nm resist design. The advantages and challenges of each will be illustrated and discussed. ©1998TAPJ.
Julian J. Hsieh
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
S.F. Fan, W.B. Yun, et al.
Proceedings of SPIE 1989
Sang-Min Park, Mark P. Stoykovich, et al.
Advanced Materials
P. Martensson, R.M. Feenstra
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films