Optimization of diblock copolymer thin film self assembly

Abstract

The quality of spontaneously self-assembled diblock copolymer thin films was quantitatively analyzed. The effect of polymer film thickness, anneal time, anneal temperature, and polymer molecular weight on self assembly process were discussed. Pore uniformity and long-range order in the self-assembled films was improved by optimizing the process conditions. A maximum film thickness of 42 nm was found to be suitable for achieving well ordered templates with 67000 g/mol molecular weight polystyrene-poly(methyl methacrylate).