Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
No abstract available.
Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
Douglass S. Kalika, David W. Giles, et al.
Journal of Rheology
O.F. Schirmer, K.W. Blazey, et al.
Physical Review B
R.M. Macfarlane, R.L. Cone
Physical Review B - CMMP