Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
This paper describes the implementation of an online feedback-directed optimization system. The system is fully automatic; it requires no prior (offline) profiling run. It uses a previously developed low-overhead instrumentation sampling framework to collect control flow graph edge profiles. This profile information is used to drive several traditional optimizations, as well as a novel algorithm for performing feedback-directed control flow graph node splitting. We empirically evaluate this system and demonstrate improvements in peak performance of up to 17% while keeping overhead low, with no individual execution being degraded by more than 2% because of instrumentation.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Chi-Leung Wong, Zehra Sura, et al.
I-SPAN 2002
Raymond F. Boyce, Donald D. Chamberlin, et al.
CACM
M.F. Cowlishaw
IBM Systems Journal